SIG1 5μm Silicon-Based Interdigitated Gold Electrode Photoelectric Detection Sensor Chip MEMS High-Precision Sensor - Image 1
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    SIG1 5μm Silicon-Based Interdigitated Gold Electrode Photoelectric Detection Sensor Chip MEMS High-Precision Sensor

    $33.00

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    SKU: SIG1 Category:
    Description
    Potentiolab • Silicon-Based Gold IDE Sensor

    5μm Silicon-Based Interdigitated Gold Electrode MEMS Sensor Chip

    High-precision 5μm silicon-based interdigitated gold electrode designed for MEMS photoelectric detection, chemical, physical, biological, and medical sensor chip applications.

    5μm IDE PatternMEMS Sensor Chip

    Ti/Au Gold Electrode

    5 micron silicon based interdigitated gold electrode MEMS photoelectric detection sensor chip
    high precision silicon based interdigitated gold electrode chip for photoelectric sensing detection
    High-Precision IDE Structure
    • Line width: 5μm
    • Line spacing: 5μm
    • Finger length: 1.5mm
    • 100 pairs / 200 fingers
    Silicon-Based MEMS Structure
    • Single-crystal silicon substrate (P-type)
    • Surface-grown SiO₂ insulating layer
    • SiO₂ thickness: 300nm
    • Suitable for MEMS sensor integration
    Ti/Au Gold Electrode Layer
    • Metal layer structure: Ti/Au
    • Ti thickness: 30nm
    • Au thickness: 100nm
    • Excellent conductivity and stability
    Wide Operating Temperature
    • Operating temperature: -150°C to 500°C
    • Excellent thermal stability
    • Reliable sensing performance
    • Suitable for harsh laboratory environments
    Typical Applications
    • Photoelectric detection systems
    • MEMS high-precision sensors
    • Chemical and physical sensors
    • Biological sensing systems
    • Medical sensor research
    ItemSpecification
    Product Name5μm Silicon-Based Interdigitated Gold Electrode MEMS Sensor Chip
    SubstrateSingle-crystal silicon (P-type)
    Insulating LayerSurface-grown SiO₂, 300nm
    Overall Size4mm × 7mm × 0.52mm
    Line Width5μm
    Line Spacing5μm
    Finger Length1.5mm
    Interdigitated Pairs100 pairs / 200 fingers
    Metal Layer StructureTi/Au
    Metal Layer ThicknessTi 30nm / Au 100nm
    Operating Temperature-150°C to 500°C
    Product Advantages
    This high-precision silicon-based interdigitated gold electrode features a 5μm IDE structure, SiO₂-insulated single-crystal silicon substrate, and Ti/Au conductive layer system. It is suitable for MEMS photoelectric detection, chemical, physical, biological, and medical sensing applications requiring reliable performance and stable quality.
    Precautions
    • Handle carefully to avoid scratching the electrode surface.
    • Avoid mechanical impact or excessive force on the silicon substrate.
    • Clean gently with suitable laboratory-grade solvents before use.
    • Store in a clean, dry, and dust-free environment.
    • Custom electrode dimensions and patterns are available upon request.
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    Worldwide Shipping

    Potentiolab ships electrochemical electrodes, electrochemical cells, and laboratory accessories to universities, research institutes, and laboratories worldwide. Orders are shipped primarily via FedEx International Priority (occasionally DHL or UPS) with full tracking. In-stock items are typically dispatched within one business day. Estimated delivery times are 4–6 working days for Asia, 5–7 working days for Europe and North America, and 7–9 working days for other regions. Customs clearance times may vary by country.

    Rates, Support & Orders

    Shipping fees start from USD 28, with free shipping available on qualifying orders over USD 1800. Prices exclude VAT, customs duties, or local taxes, which are the responsibility of the recipient. For bulk orders, custom electrochemical products, academic discounts, or institutional purchasing requirements, please contact our sales team at sales@potentiolab.com.

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